Molybdenum Sputtering Target of 5mm Thickness, 99.95% Pure Molybdenum Sputtering Goal, Grind Surface Molybdenum Ziel Review Metal Alloy 5mm Thick Grinding Surface Molybdenum Suttering Target Chemistry: Manufacturing process molybdenum…
GaN is a semiconductor material of third generation with a large forbidden-band width. It has superior properties compared to first-generation Si or second-generation GaAs. GaN devices, due to their high thermal conductivity and large band gaps, can…
Chemical formula: Fe2O3. Iron oxide Powder amorphous, reddish or deep-red. Water insoluble, but soluble and soluble in both sulfuric acid (HCL) and hydrochloric Acid. It may be slightly soluble or insoluble in nitric acids. Purity: 99.5%Particle size…